chip technology
optical lithography
overview how it works future applications for researchers

IBM's innovations in optical lithography are helping semiconductor researchers reduce device sizes in order to achieve both larger numbers of devices per chip, as well as increased chip performance.  Pioneering research is also being done on replacing optical lithography with shorter-wavelength x-rays.  X-ray lithography will operate at still smaller dimensions, approaching 100 nm.  This research, which is being conducted by IBM at the Fishkill, New York, and Burlington, Vermont, facilities, promises to help continue the trend of bringing ever higher densities and higher performance to semiconductor devices.

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