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Emerging analytical techniques

Vol. 44, No. 4, 2000

Order No. G322-0222
Recent dramatic advances in microelectronics have appeared concurrently with equally dramatic advances in corresponding analytical techniques. This issue contains nine papers that describe several important, emerging, physics-based techniques that play a significant role in the continued development of our chip, storage, and display technologies. The issue contains an additional paper on applying recursion to improve matrix computation performance.
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Papers may be viewed by clicking on the title of interest
Preface R. M. Tromp, Guest Editor p. 454
Synchrotron X-ray scattering techniques for microelectronics-related materials studies J. L. Jordan-Sweet p. 457
Atomic resolution analytical microscopy P. E. Batson p. 477
Growth processes and phase transformations studied in situ transmission electron microscopy F. M. Ross p. 489
Low-energy electron microscopy R. M. Tromp p. 503
Hot-electron effects and oxide degradation in MOS structures studied with ballistic electron emission microscopy R. Ludeke p. 517
X-ray spectro-microscopy of complex materials and surfaces J. Stöhr and S. Anders p. 535
Spin-polarized scanning electron microscopy R. Allenspach p. 553
Medium-energy ion scattering for analysis of microelectronic materials M. Copel p. 571
Picosecond imaging circuit analysis J. C. Tsang, J. A. Kash, and D. P. Vallett p. 583
Applying recursion to serial and parallel QR factorization leads to better performance E. Elmroth and F. G. Gustavson p. 605
Recent publications IBM authors p. 625
Patents p. 637