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Papers may be viewed by clicking on the title of interest |
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Optical lithography: Introduction
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G. L.-T. Chiu and J. M. Shaw,
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p. 3
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Lithography and optical exposure tools
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Manufacturing with DUV lithography
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S. J. Holmes, P. H. Mitchell, and M. C. Hakey,
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p. 7
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Advanced DUV photolithography in a pilot lineenvironment
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C. P. Ausschnitt, A. C. Thomas, and T. J. Wiltshire
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p. 21
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High-numerical-aperture optical designs
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R. N. Singh, A. E. Rosenbluth, G. L.-T. Chiu, and J. S. Wilczynski
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p. 39
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Lithography at a wavelength of 193 nm
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M. Rothschild, A. R. Forte, R. R. Kunz, S. C. Palmateer, and J. H. C. Sedlacek
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p. 49
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Impact of lens aberrations on optical lithography
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T. A. Brunner
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p. 57
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Resist
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Chemical amplification resists: History and development within IBM
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H. Ito
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p. 69
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Negative photoresists for optical lithography
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J. M. Shaw, J. D. Gelorme, N. C. LaBianca, W. E. Conley, and S. J. Holmes
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p. 81
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Photoresists for 193-nm lithography
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R. D. Allen, G. M. Wallraff, D. C. Hofer, and R. R. Kunz
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p. 95
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Thin-film imaging: Past, present, prognosis
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D. E. Seeger, D. C. La Tulipe, Jr., R. R. Kunz, C. M. Garza, and M. A. Hanratty
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p. 105
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Lithographic measurement tool
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Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS
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R. A. Budd, D. B. Dove, J. L. Staples, R. M. Martino, R. A. Ferguson, and J. T. Weed
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p. 119
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Laser ablation
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Large-field scanning laser ablation system
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F. E. Doany, T. Ainsworth, N. Bobroff, D. Goodman, and A. E. Rosenbluth
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p. 131
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Masks for laser ablation technology: New requirements and challenges
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J. L. Speidell, D. P. Pulaski, and R. S. Patel
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p. 143
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Laser release process to obtain freestanding multilayer metal-polyimide circuits
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F. E. Doany and C. Narayan
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p. 151
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Nonoptical lithography
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Lithography beyond light: Microcontact printing with monolayer resists
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H. A. Biebuyck, N. B. Larsen, E. Delamarche, and B. Michel
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p. 159
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Regular papers
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Fast and effective algorithms for graph partitioning and sparse-matrix ordering
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A. Gupta
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p. 171
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Recent publications by IBM authors
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p. 185
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Recent IBM patents
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p. 195
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