IBM®
Skip to main content
    Country/region [change]    Terms of use
 
 
 
    Home    Products    Services & solutions    Support & downloads    My account    

IBM Journal of Research and Development
Cell Broadband Engine Technology and Systems   Volume 51, Number 5, 2007
Table of contents: HTMLPDF This article: HTMLPDF   Copyright info

Polymer self assembly in semiconductor microelectronics - References

 by C. T. Black,
R. Ruiz,
G. Breyta,
J. Y. Cheng,
M. E. Colburn,
K. W. Guarini,
H.-C. Kim,
and Y. Zhang
References

  1. G. M. Whitesides and B. Grzybowski, “Self-Assembly at All Scales,” Science 295, 2418–2418 (2002).
  2. C. T. Black, “Integration of Self Assembly for Semiconductor Microelectronics,” Proceedings of the IEEE Custom Integrated Circuits Conference, 2005, pp. 87–91.
  3. I. W. Hamley, “Nanostructure Fabrication Using Block Copolymers,” Nanotechnology 14, R39–R54 (2003).
  4. C. Harrison, M. Park, P. M. Chaikin, R. A. Register, and D. H. Adamson, “Lithography with a Mask of Block Copolymer Microstructures,” J. Vac. Sci. Technol. B 16, 544–552 (1998).
  5. C. J. Hawker and T. P. Russell, “Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes,” MRS Bull. 30, No. 12, 952–966 (2005).
  6. M. Lazzari and M. A. Lopez-Quintela, “Block Copolymers as a Tool for Nanomaterial Fabrication,” Adv. Mater. 15, 1583ff. (2003).
  7. M. Li, A. C. Christopher, and K. O. Christopher, “Patternable Block Copolymers,” Adv. Polymer Sci. 190, 183–226 (2005).
  8. R. A. Segalman, “Patterning with Block Copolymer Thin Films,” Mater. Sci. & Eng. R-Report 48, 191–226 (2005).
  9. C. Park, J. Yoon, and E. L. Thomas, “Enabling Nanotechnology with Self Assembled Block Copolymer Patterns,” Polymer 44, No. 22, 6725–6760 (2003).
  10. M. P. Stoykovich and P. F. Nealey, “Block Copolymers and Conventional Lithography,” Mater. Today 9, No. 9, 20–29 (2006).
  11. P. Mansky, P. Chaikin, and E. L. Thomas, “Monolayer Films of Diblock Copolymer Microdomains for Nanolithographic Applications,” J. Mater. Sci. 30, No. 8, 1987–1992 (1995).
  12. P. Mansky, C. K. Harrison, P. M. Chaikin, R. A. Register, and N. Yao, “Nanolithographic Templates from Diblock Copolymer Thin Films,” Appl. Phys. Lett. 68, No. 18, 2586–2588 (1996).
  13. M. Park, C. Harrison, P. M. Chaikin, R. A. Register, and D. H. Adamson, “Block Copolymer Lithography: Periodic Arrays of ~10(11) Holes in 1 Square Centimeter,” Science 276, No. 5317, 1401–1404 (1997).
  14. F. S. Bates and G. H. Fredrickson, “Block Copolymers—Designer Soft Materials,” Phys. Today 52, 32ff. (1999).
  15. T. Thurn-Albrecht, R. Steiner, J. DeRouchey, C. M. Stafford, E. Huang, M. Bal, M. Tuominen, C. J. Hawker, and T. Russell, “Nanoscopic Templates from Oriented Block Copolymer Films,” Adv. Mater. 12, 787ff. (2000).
  16. C. T. Black and R. Ruiz, “Self Assembly in Semiconductor Microelectronics: Self-Aligned Sub-Lithographic Patterning Using Diblock Copolymer Thin Films,” SPIE Adv. Resist Technol. Process. XXIII 6153, 615302ff. (2006).
  17. K. W. Guarini, C. T. Black, and S. H. I. Yeuing, “Optimization of Diblock Copolymer Thin Film Self Assembly,” Adv. Mater. 14, 1290ff. (2002).
  18. T. Xu, J. Stevens, J. A. Villa, J. T. Goldbach, K. W. Guarim, C. T. Black, C. J. Hawker, and T. R. Russell, “Block Copolymer Surface Reconstuction: A Reversible Route to Nanoporous Films,” Adv. Funct. Mater. 13, 698ff. (2003).
  19. D. E. Angelescu, J. H. Waller, D. H. Adamson, P. Deshpande, S. Y. Chou, R. A. Register, and P. M. Chaikin, “Macroscopic Orientation of Block Copolymer Cylinders in Single-Layer Films by Shearing,” Adv. Mater. 16, No. 19, 1736–1740 (2004).
  20. M. Kimura, M. J. Misner, T. Xu, S. H. Kim, and T. P. Russell, “Long-Range Ordering of Diblock Copolymers Induced by Droplet Pinning,” Langmuir 19, 9910ff. (2003).
  21. C. Tang, A. Tracz, M. Kruk, R. Zhang, D. M. Smilgies, K. Matyjaszewski, and T. Kowalewski, “Long-Range Ordered Thin Films of Block Copolymers Prepared by Zone-Casting and Their Thermal Conversion into Ordered Nanostructured Carbon,” J. Amer. Chem. Assoc. 127, 6918ff. (2005).
  22. T. L. Morkved, M. Lu, A. M. Urbas, E. E. Ehrichs, H. M. Jaeger, P. Mansky, and T. P. Russell, “Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields,” Science 273, No. 5277, 931–933 (1996).
  23. T. Thurn-Albrecht, J. DeRouchey, T. P. Russell, and H. M. Jaeger, “Overcoming Interfacial Interactions with Electric Fields,” Macromolecules 33, 3250ff. (2000).
  24. C. De Rosa, C. Park, E. L. Thomas, and B. Lotz, “Microdomain Patterns from Directional Eutectic Solidification and Epitaxy,” Nature 405, No. 6785, 433–437 (2000).
  25. P. Mansky, Y. Liu, E. Huang, T. P. Russell, and C. Hawker, “Controlling Polymer-Surface Interactions with Random Copolymer Brushes,” Science 275, 1458ff. (1997).
  26. D. Y. Ryu, K. Shin, E. Drockenmuller, C. J. Hawker, and T. P. Russell, “A Generalized Approach to the Modification of Solid Surfaces,” Science 308, No. 5719, 236–239 (2005).
  27. E. Huang, T. P. Russell, C. Harrison, P. M. Chaikin, R. A. Register, C. J. Hawker, and J. Mays, “Using Surface Active Random Copolymers to Control the Domain Orientation in Diblock Copolymer Thin Films,” Macromolecules 31, 7641ff. (1998).
  28. A. Menelle, T. P. Russell, S. H. Anastasiadis, S. K. Satija, and C. F. Majkrzak, “Ordering of Thin Diblock Copolymer Films,” Phys. Rev. Lett. 68, 67ff. (1992).
  29. R. Ruiz, R. L. Sandstrom, and C. T. Black, “Induced Orientational Order in Symmetric Diblock Copolymer Thin Films,” Adv. Mater. 19, 587ff. (2007).
  30. X. M. Yang, R. D. Peters, P. F. Nealey, H. H. Solak, and F. Cerrina, “Guided Self-Assembly of Symmetric Diblock Copolymer Films on Chemically Nanopatterned Substrates,” Macromolecules 33, 9575ff. (2000).
  31. T. Thurn-Albrecht, J. Schotter, C. A. Kastle, N. Emley, T. Shibauchi, L. Krusin-Elbaum, K. Guarini, C. T. Black, M. T. Tuominen, and T. P. Russell, “Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates,” Science 290, 2126ff. (2000).
  32. S. G. Xiao, X. M. Yang, E. W. Edwards, Y. H. La, and P. F. Nealey, “Graphoepitaxy of Cylinder-Forming Block Copolymers for Use as Templates to Pattern Magnetic Metal Dot Arrays,” Nanotechnology 16, S324–S329 (2005).
  33. J. Y. Cheng, C. A. Ross, V. Z. H. Chan, E. L. Thomas, R. G. H. Lammertink, and G. J. Vancso, “Formation of a Cobalt Magnetic Dot Array Via Block Copolymer Lithography,” Adv. Mater. 13, 1174ff. (2001).
  34. K. Naito, H. Hieda, M. Sakurai, Y. Kamata, and K. Asakawa, “2.5-Inch Disk Patterned Media Prepared by an Artificially Assisted Self-Assembling Method,” IEEE Trans. Magn. 38, 1949ff. (2002).
  35. R. R. Li, P. D. Dapkus, M. E. Thompson, W. G. Jeong, C. Harrison, P. M. Chaikin, R. A. Register, and D. H. Adamson, “Dense Arrays of Ordered GaAs Nanostructures by Selective Area Growth on Substrates Patterned by Block Copolymer Lithography,” Appl. Phys. Lett. 76, 1689ff. (2000).
  36. J. P. Spatz, T. Herzog, S. Mossmer, P. Ziemann, and M. Moller, “Micellar Inorganic-Polymer Hybrid Systems—A Tool for Nanolithography,” Adv. Mater. 11, 149–153 (1999).
  37. W. A. Lopes and H. M. Jaeger, “Hierarchical Self-Assembly of Metal Nanostructures on Diblock Copolymer Scaffolds,” Nature 414, 735–738 (2001).
  38. C. Hinderling, Y. Keles, T. Stockli, H. E. Knapp, T. de los Arcos, P. Oelhafen, I. Korczagin, et al., “Organometallic Block Copolymers as Catalyst Precursors for Templated Carbon Nanotube Growth,” Adv. Mater. 16, No. 11, 876–879 (2004).
  39. H. H. Chen and D. D. Ling, “Power Supply Noise Analysis Methodology for Deep-Submicron VLSI Chip Design,” Proceedings of the 34th annual ACM–IEEE Conference on Design Automation, 1997, pp. 638–643.
  40. N. Kasai, “Trend in DRAM Structures and Processes to Giga-Bit Generations,” NEC Res. & Dev. 40, 267–271 (1999).
  41. J. F. Scott and C. A. P. D. Araujo, “Ferroelectric Memories,” Science 246, 1400ff. (1989).
  42. K. P. Muller, B. Flietner, C. L. Hwang, R. L. Kleinhenz, T. Nakao, R. Ranade, Y. Tsunashima, and T. Mii, “Trench Storage Node Technology for Gigabit DRAM Generations,” Transactions of the IEEE International Electron Devices Meeting, 1996, pp. 507–510.
  43. D. E. Kotecki, J. D. Baniecki, H. Shen, R. B. Laibowitz, K. L. Saenger, J. J. Lian, T. M. Shaw, et al., “(Ba, Sr)TiO3 Dielectrics for Future Stacked-Capacitor DRAM,” IBM J. Res. & Dev. 43, No. 3, 367–382 (1999).
  44. M. Ino, J. Miyano, H. Kurogi, H. Tamura, Y. Nagatomo, and M. Yoshimaru, “Rugged Surface Polycrystalline Silicon Film Deposition and Its Application in a Stacked Dynamic Random Access Memory Capacitor Electrode,” J. Vac. Sci. Technol. B 14, 751ff. (1996).
  45. E. P. Gusev, E. Cariter, D. A. Buchanan, M. Gribelyuk, M. Copel, H. Okorn-Schmidt, and C. D'Emic, “Ultrathin High-k Metal Oxides on Silicon: Processing, Characterization, and Integration Issues,” Microelectron. Eng. 59, 341ff. (2001).
  46. C. T. Black, K. W. Guarini, K. R. Milkove, S. M. Baker, T. P. Russell, and M. T. Tuominen, “Integration of Self-Assembled Diblock Copolymers for Semiconductor Capacitor Fabrication,” Appl. Phys. Lett. 79, 409ff. (2001).
  47. C. T. Black, K. W. Guarini, Y. Zhang, H. J. Kim, J. Benedict, E. Sikorski, I. V. Babich, and K. R. Milkove, “High-Capacity, Self-Assembled Metal-Oxide-Semiconductor Decoupling Capacitors,” IEEE Electron Device Lett. 25, 622ff. (2004).
  48. K. W. Guarini, C. T. Black, Y. Zhang, H. Kim, E. M. Sikorski, and I. V. Babich, “Process Integration of Self-Assembled Polymer Templates into Silicon Nanofabrication,” J. Vac. Sci. Technol. B 20, 2788ff. (2002).
  49. H. Kim, A. J. Kellock, and S. M. Rossnagel, “Growth of Cubic TaN Thin Films by Plasma Enhanced-Atomic Layer Deposition Using Inorganic Metal Precursor,” J. Appl. Phys. 92, 7080ff. (2002).
  50. R. K. Ellis, “Fowler–Nordheim Emission from Nonplanar Surfaces,” IEEE Electron Device Lett. 3, 330–332 (1982).
  51. K. W. Guarini, C. T. Black, K. R. Milkove, and R. L. Sandstrom, “Nanoscale Patterning Using Self-Assembled Polymers for Semiconductor Applications,” J. Vac. Sci. Technol. B 19, 2784ff. (2001).
  52. T. Xu, H.-C. Kim, J. DeRouchey, C. Seney, C. Levesque, P. Martin, C. M. Stafford, and T. P. Russell, “The Influence of Molecular Weight on Nanoporous Polymer Films,” Polymer 42, 9091ff. (2001).
  53. C. T. Black, K. W. Guarini, G. Breyta, M. C. Colburn, R. Ruiz, R. L. Sandstrom, E. M. Sikorski, and Y. Zhang, “Highly Porous Silicon Membrane Fabrication Using Polymer Self-Assembly,” J. Vac. Sci. Technol. B 24, 3188–3191 (2006).
  54. A. Loni, L. T. Canham, M. G. Berger, R. Arens-Fischer, H. Munder, H. Luth, H. F. Arrand, and T. M. Benson, “Porous Silicon Multilayer Optical Waveguides,” Thin Solid Films 276, 143ff. (1996).
  55. A. Jain, S. Rogojevic, S. Ponoth, N. Agarwal, I. Matthew, W. N. Gill, P. Persans, M. Tomozawa, J. L. Plawsky, and E. Simonyi, “Porous Silica Materials as Low-k Dielectrics for Electronic and Optical Interconnects,” Thin Solid Films 398-399, 513–522 (2001).
  56. R. W. Boyd, Non-Linear Optics, Elsevier, San Diego, CA, 2003; see p. 380.
  57. A. Garahan, L. Pilon, J. Yin, and I. Saxena, “Effective Optical Properties of Absorbing Nanoporous and Nanocomposite Thin Films,” J. Appl. Phys. 101, 014320ff. (2007).
  58. S. Y. Yang, I. Ryu, H. Y. Kim, J. K. Kim, S. K. Jang, and T. P. Russell, “Nanoporous Membranes with Ultrahigh Selectivity and Flux for the Filtration of Viruses,” Adv. Mater. 18, 709ff. (2006).
  59. T. A. Desai, D. J. Hansford, L. Kulinsky, A. H. Nashat, G. Rasi, J. Tu, W. Yuchun, Z. Miqin, and M. Ferrari, “Nanopore Technology for Biomedical Applications,” Biomed. Microdevices 2, 11ff. (1999).
  60. L. Leoni, A. Boiarski, and T. A. Desai, “Characterization of Nanoporous Membranes for Immunoisolation: Diffusion Properties and Tissue Effects,” Biomed. Microdevices 4, 131ff. (2002).
  61. L. Leoni and T. A. Desai, “Biotransport and Biocompatibility of Nanoporous Biocapsules,” Proceedings of the International IEEE–EMBS Special Topic Conference on Microtechnologies in Medicine and Biology, 2000, pp. 113–117.
  62. K. B. Jirage, J. C. Hulteen, and C. R. Martin, “Nanotubule-Based Molecular-Filtration Membranes,” Science 278, 655ff. (1997).
  63. U. Jeong, H. C. Kim, R. L. Rodriguez, I. Y. Tsai, C. M. Stafford, J. K. Kim, C. J. Hawker, and T. P. Russell, “Asymmetric Block Copolymers with Homopolymers: Routes to Multiple Length Scale Nanostructures,” Adv. Mater. 14, No. 4., 274–276 (2002).
  64. U. Y. Jeong, D. Y. Ryu, J. K. Kim, D. H. Kim, T. P. Russell, and C. J. Hawker, “Volume Contractions Induced by Crosslinking: A Novel Route to Nanoporous Polymer Films,” Adv. Mater. 15, 1247ff. (2003).
  65. C. T. Black, K. W. Guarini, R. Ruiz, E. M. Sikorski, I. V. Babich, R. L. Sandstrom, and Y. Zhang, “Polymer Self Assembly in Semiconductor Microelectronics,” 2006 IEEE International Electron Devices Meeting Technical Digest, 2007, pp. 16.3ff.
  66. K. W. Guarini, C. T. Black, Y. Zhang, I. V. Babich, E. M. Sikorski, and L. M. Gignac, “Low Voltage, Scalable Nanocrystal Flash Memory Fabricated by Templated Self Assembly,” IEEE International Electron Devices Meeting Technical Digest, 2003, pp. 22.2.1–22.2.4.
  67. S. K. Lai, “Floating Gate Memories: Moore's Law Continues,” Proceedings of the 2005 IEEE VLSI–TSA International Symposium on VLSI Technology, pp. 74–77.
  68. P. Pavan, R. Bez, P. Olivo, and E. Zanoni, “Flash Memory Cells—An Overview,” Proc. IEEE 85, No. 8, 1248–1271 (1997).
  69. J. De Blauwe, “Nanocrystal Nonvolatile Memory Devices,” IEEE Trans. Nanotechnol. 1, 72ff. (2002).
  70. H. I. Hanafi, S. Tiwari, and I. Khan, “Fast and Long Retention-Time Nano-Crystal Memory,” IEEE Trans. Electron Devices 43, 1553ff. (1996).
  71. S. Tiwari, F. Rana, H. Hanafi, A. Hartstein, E. F. Crabbe, and K. Chan, “A Silicon Nanocrystals Based Memory,” Appl. Phys. Lett. 68, 1377ff. (1996).
  72. K. Pangai, C. Abraham, M. Wang, N. Hien, J. Coulter, T. Begley, and S. Soss, “90nm Multi-Level-Cell Flash Memory Technology,” Proceedings of the IEEE International Symposium on Semiconductor Manufacturing (ISSM 2005), 2005, pp. 197–199.
  73. E. J. Prinz, J. Yater, R. Steimle, M. Sadd, C. Swift, and C. Ko-Min, “A 90nm Embedded 2-Bit Per Cell Nanocrystal Flash EEPROM,” Proceedings of the 2006 IEEE Non-Volatile Semiconductor Memory Workshop, pp. 62–63.
  74. T. Ishii, T. Osabe, T. Mine, F. Murai, and K. Yano, “Engineering Variations: Towards Practical Single-Electron (Few-Electron) Memory,” IEEE International Electron Devices Meeting Technical Digest, 2000, pp. 305–308.
  75. M. L. Ostraat, J. W. De Blauwe, M. L. Green, L. D. Bell, M. L. Brongersma, J. Casperson, R. C. Flagan, and H. A. Atwater, “Synthesis and Characterization of Aerosol Silicon Nanocrystal Nonvolatile Floating-Gate Memory Devices,” Appl. Phys. Lett. 79, 433ff. (2001).
  76. B. Ashok, M. Muthukumar, and T. P. Russell, “Confined Thin Film Diblock Copolymer in the Presence of an Electric Field,” J. Chem. Phys. 115, 1559ff. (2001).
  77. A. Boker, K. Schmidt, A. Knoll, H. Zettl, H. Hansel, V. Urban, V. Abetz, and G. Krausch, “The Influence of Incompatibility and Dielectric Contrast on the Electric Field-Induced Orientation of Lamellar Block Copolymers,” Polymer 47, 849ff. (2006).
  78. K. Schmidt, A. Boker, H. Zettl, F. Schubert, H. Hansel, F. Fischer, T. M. Weiss, et al., “Influence of Initial Order on the Microscopic Mechanism of Electric Field Induced Alignment of Block Copolymer Microdomains,” Langmuir 21, 11974ff. (2005).
  79. J. Y. Wang, T. Xu, J. M. Leiston-Belanger, S. Gupta, and T. P. Russell, “Ion Complexation: A Route to Enhanced Block Copolymer Alignment with Electric Fields,” Phys. Rev. Lett. 96, 128301ff. (2006).
  80. T. Xu, Y. Q. Zhu, S. P. Gido, and T. P. Russell, “Electric Field Alignment of Symmetric Diblock Copolymer Thin Films,” Macromolecules 37, 2625ff. (2004).
  81. G. Arya, J. Rottler, A. Z. Panagiotopoulos, D. J. Srolovitz, and P. M. Chaikin, “Shear Ordering in Thin Films of Spherical Block Copolymer,” Langmuir 21, No. 24, 11518–11527 (2005).
  82. I. W. Hamley, V. Castelletto, O. O. Mykhaylyk, and A. J. Gleeson, “Mesoscopic Crystallography of Shear-Aligned Soft Materials,” J. Appl. Crystallogr. 37, 341ff. (2004).
  83. H. W. Li and W. T. S. Huck, “Ordered Block-Copolymer Assembly Using Nanoimprint Lithography,” Nano Lett. 4, 1633ff. (2004).
  84. D. Sundrani and S. J. Sibener, “Spontaneous Spatial Alignment of Polymer Cylindrical Nanodomains on Silicon Nitride Gratings,” Macromolecules 35, 8531ff. (2002).
  85. M. W. Wu, R. A. Register, and P. M. Chaikin, “Shear Alignment of Sphere-Morphology Block Copolymer Thin Films with Viscous Fluid Flow,” Phys. Rev. E 74, 040801ff. (2006).
  86. L. Corte, K. Yamauchi, F. Court, M. Cloitre, T. Hashimoto, and L. Leibler, “Annealing and Defect Trapping in Lamellar Phases of Triblock Terpolymers,” Macromolecules 36, 7695ff. (2003).
  87. E. M. Freer, L. E. Krupp, W. D. Hinsberg, P. M. Rice, J. L. Hedrick, J. N. Cha, R. D. Miller, and H. C. Kim, “Oriented Mesoporous Organosilicate Thin Films,” Nano Lett. 5, 2014ff. (2005).
  88. S. H. Kim, M. J. Misner, and T. P. Russell, “Solvent-Induced Ordering in Thin Film Diblock Copolymer/Homopolymer Mixtures,” Adv. Mater. 16, 2119ff. (2004).
  89. S. H. Kim, M. J. Misner, T. Xu, M. Kimura, and T. P. Russell, “Highly Oriented and Ordered Arrays from Block Copolymers Via Solvent Evaporation,” Adv. Mater. 16, 226–231 (2004).
  90. C. Park, J. Y. Cheng, M. J. Fasolka, A. M. Mayes, C. A. Ross, E. L. Thomas, and C. De Rosa, “Double Textured Cylindrical Block Copolymer Domains Via Directional Solidification on a Topographically Patterned Substrate,” Appl. Phys. Lett. 79, 848ff. (2001).
  91. G. Reiter, G. Castelein, J.-U. Sommer, A. Rottele, and T. Thurn-Albrecht, “Direct Visualization of Random Crystallization and Melting in Arrays of Nanometer-Size Polymer Crystals,” Phys. Rev. Lett. 87, 226101ff. (2001).
  92. V. S. RamachandraRao, R. R. Gupta, T. P. Russell, and J. J. Watkins, “Enhancement of Diblock Copolymer Ordering Kinetics by Supercritical Carbon Dioxide Annealing,” Macromolecules 34, 7923ff. (2001).
  93. C. T. Black and O. Bezencenet, “Nanometer-Scale Pattern Registration and Alignment by Directed Diblock Copolymer Self-Assembly,” IEEE Trans. Nanotechnol. 3, 412ff. (2004).
  94. J. Y. Cheng, C. A. Ross, E. L. Thomas, H. I. Smith, and G. J. Vancso, “Templated Self-Assembly of Block Copolymers: Effect of Substrate Topography,” Adv. Mater. 15, 1599ff. (2003).
  95. M. R. Hammond, E. Cochran, G. H. Fredrickson, and E. J. Kramer, “Temperature Dependence of Order, Disorder, and Defects in Laterally Confined Diblock Copolymer Cylinder Monolayers,” Macromolecules 38, 6575ff. (2005).
  96. M. R. Hammond and E. J. Kramer, “Edge Effects on Thermal Disorder in Laterally Confined Diblock Copolymer Cylinder Monolayers,” Macromolecules 39, 1538ff. (2006).
  97. R. A. Segalman, A. Hexemer, and E. J. Kramer, “Effects of Lateral Confinement on Order in Spherical Domain Block Copolymer thin Films, Macromolecules 36, 6831ff. (2003).
  98. R. A. Segalman, K. E. Schaefer, G. H. Fredrickson, E. J. Kramer, and S. Magonov, “Topographic Templating of Islands and Holes in Highly Asymmetric Block Copolymer Films,” Macromolecules 36, 4498ff. (2003).
  99. D. Sundrani, S. B. Darling, and S. J. Sibener, “Hierarchical Assembly and Compliance of Aligned Nanoscale Polymer Cylinders in Confinement,” Langmuir 20, 5091ff. (2004).
  100. D. Sundrani, S. B. Darling, and S. J. Sibener, “Guiding Polymers to Perfection: Macroscopic Alignment of Nanoscale Domains,” Nano Lett. 4, 273ff. (2004).
  101. E. W. Edwards, M. P. Stoykovich, M. Muller, H. H. Solak, J. J. de Pablo, and P. F. Nealey, “Mechanism and Kinetics of Ordering in Diblock Copolymer Thin Films on Chemically Nanopatterned Substrates,” J. Polymer Sci. B: Polymer Phys. 43, 3444ff. (2005).
  102. M. J. Fasolka, D. J. Harris, A. M. Mayes, M. Yoon, and S. G. J. Mochrie, “Observed Substrate Topography-Mediated Lateral Patterning of Diblock Copolymer Films,” Phys. Rev. Lett. 79, 3018ff. (1997).
  103. S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey, “Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates,” Nature 424, 411ff. (2003).
  104. L. Rockford, Y. Liu, P. Mansky, T. P. Russell, M. Yoon, and S. G. J. Mochrie, “Polymers on Nanoperiodic, Heterogeneous Surfaces,” Phys. Rev. Lett. 82, 2602ff. (1999).
  105. Q. Wang, S. K. Nath, M. D. Graham, P. F. Nealey, and J. J. de Pablo, “Symmetric Diblock Copolymer Thin Films Confined Between Homogeneous and Patterned Surfaces: Simulations and Theory,” J. Chem. Phys. 112, 9996ff. (2000).
  106. R. A. Segalman, H. Yokoyama, and E. J. Kramer, “Graphoepitaxy of Spherical Domain Block Copolymer Films,” Adv. Mater. 13, 1152ff. (2001).
  107. K. Asakawa, T. Hiraoka, H. Hieda, M. Sakurai, and Y. Kamata, “Nanopatterning for Patterned-Media Using Block-Copolymer,” J. Photopolymer Sci. Technol. 16, 465ff. (2002).
  108. L.-W. Chang and H. S. P. Wong, “Diblock Copolymer Directed Self-Assembly for CMOS Device Fabrication,” Design and Process Integration for Microelectronic Manufacturing IV, A. K. Wong and V. K. Singh, Editors, Proc. SPIE 6156, 329–334 (2006).
  109. J. Y. Cheng, A. M. Mayes, and C. A. Ross, “Nanostructure Engineering by Templated Self-Assembly of Block Copolymers,” Nature Mater. 3, 823ff. (2004).
  110. J. Y. Cheng, C. A. Ross, E. L. Thomas, H. I. Smith, and G. J. Vancso, “Fabrication of Nanostructures with Long-Range Order Using Block Copolymer Lithography,” Appl. Phys. Lett. 81, 3657ff. (2002).
  111. M. Q. Li, K. Douki, K. Goto, X. F. Li, C. Coenjarts, D. M. Smilgies, and C. K. Ober, “Spatially Controlled Fabrication of Nanoporous Block Copolymers,” Chem. Mater. 16, 3800ff. (2004).
  112. T. Yamaguchi and H. Yamaguchi, “Resist-Pattern Guided Self-Assembly of Symmetric Diblock Copolymer,” J. Photopolymer Sci. Technol. 19, 385ff. (2006).
  113. X. M. Yang, S. G. Xiao, C. Liu, K. Pelhos, and K. Minor, “Nanoscopic Templates Using Self-Assembled Cylindrical Diblock Copolymers for Patterned Media,” J. Vac. Sci. Technol. B 22, 3331–3334 (2004).
  114. S.-M. Park, S. M. P, R. Ruiz, Y. Zhang, C. T. Black, and P. F. Nealey, “Directed Assembly of Lamellae-Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates,” Adv. Mater. 19, 607ff. (2007).
  115. R. Ruiz, N. Ruiz, Y. Zhang, R. L. Sandstrom, and C. T. Black, “Local Defectivity Control of Two-Dimensional Self-Assembled Block Copolymer Patterns,” Adv. Mater., in press (2007).
  116. E. W. Edwards, M. F. Montague, H. H. Solak, C. J. Hawker, and P. F. Nealey, “Precise Control Over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates,” Adv. Mater. 16, 1315ff. (2004).
  117. E. W. Edwards, M. Muller, M. P. Stoykovich, H. H. Solak, J. J. de Pablo, and P. F. Nealey, “Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates,” Macromolecules 40, 90ff. (2007).
  118. M. P. Stoykovich, M. Muller, S. O. Kim, H. H. Solak, E. W. Edwards, J. J. de Pablo, and P. F. Nealey, “Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures,” Science 308, 1442ff. (2005).
  119. G. M. Wilmes, D. A. Durkee, N. P. Balsara, and J. A. Liddle, “Bending Soft Block Copolymer Nanostructures by Lithographically Directed Assembly,” Macromolecules 39, 2435ff. (2006).
  120. P.-G. De Gennes and J. Prost, The Physics of Liquid Crystals, 2nd ed., Oxford Science Publications, Clarendon Press, New York, 1993, pp. 1–597.
  121. M. Kleman and O. D. Lavrentovich, Soft Matter Physics: An Introduction, Springer-Verlag, New York, 2003.
  122. Semiconductor Industry Association, International Technology Roadmap for Semiconductors: 2005 Edition; see http://www.itrs.net/Links/2005ITRS/Home2005.htm.
  123. T. P. Russell, R. P. Hjelm, Jr., and P. A. Seeger, “Temperature Dependence of the Interaction Parameter of Polystyrene and Poly(Methy1 Methacrylate),” Macromolecules 23, 890ff. (1990).
  124. H. B. Eitouni, N. P. Balsara, H. Hahn, J. A. Pople, and M. A. Hempenius, “Thermodynamic Interactions in Organometallic Block Copolymers: Poly(styrene-block-ferrocenyldimethylsilane),” Macromolecules 35, 7765ff. (2002).
  125. K. H. Dai and E. J. Kramer, “Determining the Temperature-Dependent Flory Interaction Parameter for Strongly Immiscible Polymers from Block Copolymer Segregation Measurements,” Polymer 35, 157ff. (1994).
  126. M. C. Dalvi, C. E. Eastman, and T. P. Lodge, “Diffusion in Microstructured Block Copolymers: Chain Localization and Entanglements,” Phys. Rev. Lett. 71, 2591ff. (1993).
  127. T. P. Lodge and M. C. Dalvi, “Mechanisms of Chain Diffusion in Lamellar Block Copolymers,” Phys. Rev. Lett. 75, 657ff. (1995).
  128. C. A. Ross, “Patterned Magnetic Recording Media,” Ann. Rev. Mater. Res. 31, 203ff. (2001).
  129. B. D. Terris and T. Thomson, “Nanofabricated and Self-Assembled Magnetic Structures as Data Storage Media,” J. Phys. D: App. Phys. 38, R199–R222 (2005).
  130. C. Harrison, P. M. Chaikin, D. A. Huse, R. A. Register, D. H. Adamson, A. Daniel, E. Huang, et al., “Reducing Substrate Pinning of Block Copolymer Microdomains with a Buffer Layer of Polymer Brushes,” Macromolecules 33, 857ff. (2000).
  131. M. S. Turner, “Equilibrium Properties of a Diblock Copolymer Lamellar Phase Confined Between Flat Plates,” Phys. Rev. Lett. 69, 1788ff. (1992).
  132. D. G. Walton, G. J. Kellogg, A. M. Mayes, P. Lambooy, and T. P. Russell, “A Free-Energy Model for Confined Diblock Copolymers,” Macromolecules 27, 6225ff. (1994).
  133. C. T. Black, “Self-Aligned Self Assembly of Multi-Nanowire Silicon Field Effect Transistors,” Appl. Phys. Lett. 87, 163116ff. (2005).
  134. C. Harrison, D. E. Angelescu, M. Trawick, Z. D. Cheng, D. A. Huse, P. M. Chaikin, D. A. Vega, J. M. Sebastian, R. A. Register, and D. H. Adamson, “Pattern Coarsening in a 2D Hexagonal System,” Europhys. Lett. 67, 800ff. (2004).
  135. R. A. Segalman, A. Hexemer, R. C. Hayward, and E. J. Kramer, “Ordering and Melting of Block Copolymer Spherical Domains in 2 and 3 Dimensions,” Macromolecules 36, 3272ff. (2003).
  136. C. Harrison, D. H. Adamson, Z. Cheng, J. M. Sebastian, S. Sethuraman, D. A. Huse, R. A. Register, and P. M. Chaikin, “Mechanisms of Ordering in Striped Patterns,” Science 290, 1558ff. (2000).
  137. C. Harrison, Z. Cheng, S. Sethuraman, D. A. Huse, P. M. Chaikin, D. A. Vega, J. M. Sebastian, R. A. Register, and D. H. Adamson, “Dynamics of Pattern Coarsening in a Two-Dimensional Smectic System,” Phys. Rev. E: Stat. Nonlin. Soft Matter Phys. 66, 011706ff. (2002).
  138. M. Ieong, B. Doris, J. Kedzierski, K. Rim, and M. Yang, “Silicon Device Scaling to the Sub-10-nm Regime,” Science 306, 2057ff. (2004).
  139. P. Ball, “Material Witness: Silicon Still Supreme,” Nature Mater. 4, 119ff. (2005).
  140. D. Hisamoto, L. Wen-Chin, J. Kedzierski, H. Takeuchi, K. Asano, C. Kuo, E. Anderson, K. Tsu-Jae, J. Bokor, and H. Chenming, “FinFET—A Self-Aligned Double-Gate MOSFET Scalable to 20 nm,” IEEE Trans. Electron Devices 47, 2320ff. (2000).
  141. B. S. Doyle, S. Datta, M. Doczy, S. Hareland, B. Jin, J. Kavalieros, T. Linton, A. Murthy, R. Rios, and R. Chau, “High Performance Fully-Depleted Tri-Gate CMOS Transistors,” IEEE Electron Device Lett. 24, 263ff. (2003).
  142. Y. Huang, X. Duan, Y. Cui, L. J. Lauhon, K.-H. Kim, and C. M. Lieber, “Logic Gates and Computation from Assembled Nanowire Building Blocks,” Science 294, 1313ff. (2001).
  143. R. Chau, B. Doyle, M. Doczy, S. Datta, S. Hareland, B. Jin, J. Kavalieros, and M. Metz, “Silicon Nano-Transistors and Breaking the 10 nm Physical Gate Length Barrier,” Proceedings of the Device Research Conference, 2003, pp. 123–126.
  144. J. Kedzierski, D. M. Fried, E. J. Nowak, T. Kanarsky, J. H. Rankin, H. Hanafi, W. Natzle, et al., “High-Performance Symmetric-Gate and CMOS-Compatible Vt Asymmetric-Gate FinFET Devices,” IEEE International Electron Devices Meeting Technical Digest, 2001, pp. 19.5.1–19.5.4.
  145. M. O. Aboelfotoh and K. N. Tu, “Schottky-Barrier Heights of Ti and TiSi2 on n-Type and p-Type Si(100),” Phys. Rev. B: Condensed Matter 34, 2311ff. (1986).
  146. M. Nishisaka, Y. Ochiai, and T. Asano, “Pt–Si Source and Drain SOI-MOSFET Operating in Bi-Channel Mode,” Proceedings of the Device Research Conference, 1998, pp. 74–75.
  147. J. Kedzierski, P. Xuan, E. H. Anderson, J. Bokor, T.-J. King, and C. Hu, “Complementary Silicide Source/Drain Thin-Body MOSFETs for the 20 nm Gate Length Regime,” IEEE International Electron Devices Meeting Technical Digest, 2000, pp. 57–60.
  148. C. Wang, P. S. John, and J. R. Tucker, “Sub-40 nm PtSi Schottky Source/Drain Metal-Oxide-Semiconductor Field-Effect Transistors,” App. Phys. Lett. 74, 1174ff. (1999).
  149. G. Jing and M. S. Lundstrom, “A Computational Study of Thin-Body, Double-Gate, Schottky Barrier MOSFETs,” IEEE Trans. Electron Devices 49, 1897ff. (2002).
  150. F. S. Bates and G. H. Fredrickson, “Block Copolymer Thermodynamics: Theory and Experiment,” Ann. Rev. Phys. Chem. 41, 525ff. (1990).
  151. E. Helfand and Y. Tagami, “Theory of the Interface Between Immiscible Polymers,” J. Chem. Phys. 57, 1812ff. (1972).
  152. A. N. Semenov, “Contribution to the Theory of Microphase Layering in Block-Copolymer Melts,” Sov. Phys. JETP 61, 733ff. (1985).
  153. I. W. Hamley, The Physics of Block Copolymers, Oxford Science Publications, Oxford University Press, New York, 1998, pp. 85, 256.
  154. J. D. Ferry, Viscoelastic Properties of Polymers, 3rd Ed., Wiley, New York, 1980, pp. 330–331.
  155. L. Leibler, “Theory of Microphase Separation in Block Copolymers,” Macromolecules 13, 1902ff. (1980).
  156. S. H. Anastasiadis, T. P. Russell, S. K. Satija, and C. F. Majkrzak, “The Morphology of Symmetric Diblock Copolymers as Revealed by Neutron Reflectivity,” J. Chem. Phys. 92, 5677ff. (1990).
  157. D. Broseta, G. H. Fredrickson, E. Helfand, and L. Leibler, “Molecular Weight and Polydispersity Effects at Polymer–Polymer Interfaces,” Macromolecules 23, 132ff. (1990).
  158. D. Broseta, L. Leibler, L. O. Kaddour, and C. Strazielle, “A Theoretical and Experimental Study of Interfacial Tension of Immiscible Polymer Blends in Solution,” J. Chem. Phys. 87, 7248ff. (1987).
  159. E. Helfand and A. M. Sapse, “Theory of Unsymmetric Polymer–Polymer Interfaces,” J. Chem. Phys. 62, 1327ff. (1975).
  160. E. Helfand and Y. Tagami, “Theory of the Interface Between Immiscible Polymers. II,” J. Chem. Phys. 56, 3592ff. (1972).
  161. S. H. Anastasiadis, T. P. Russell, S. K. Satija, and C. F. Majkrzak, “Neutron Reflectivity Studies of the Surface-Induced Ordering of Diblock Copolymer Films,” Phys. Rev. Lett. 62, 1852ff. (1989).
  162. P. F. Green, T. P. Russell, R. Jerome, and M. Granville, “Diffusion of Homopolymers into Nonequilibrium Block Copolymer Structures. 1. Molecular Weight Dependence,” Macromolecules 21, 3266ff. (1988).
  163. G. Coulon, B. Collin, D. Ausserre, D. Chatenay, and T. P. Russell, “Islands and Holes on the Free-Surface of Thin Diblock Copolymer Films. 1. Characteristics of Formation and Growth,” J. de Physique 51, 2801ff. (1990).
  164. G. Coulon, B. Collin, D. Chatenay, and Y. Gallot, “Kinetics of Growth of Islands and Holes on the Free-Surface of Thin Diblock Copolymer Films,” J. de Physique II 3, 697–717 (1993).
  165. H. C. Kim and T. P. Russell, “Ordering in Thin Films of Asymmetric Diblock Copolymers,” J. Polymer Sci. B: Polymer Phys. 39, 663ff. (2001).
  166. A. Knoll, A. Horvat, K. S. Lyakhova, G. Krausch, G. J. A. Sevink, A. V. Zvelindovsky, and R. Magerle, “Phase Behavior in Thin Films of Cylinder-Forming Block Copolymers,” Phys. Rev. Lett. 89, 035501ff. (2002).
  167. L. Zhu, S. Z. D. Cheng, B. H. Calhoun, Q. Ge, R. P. Quirk, E. L. Thomas, B. S. Hsiao, F. Yeh, and B. Lotz, “Phase Structures and Morphologies Determined by Self-Organization, Vitrification, and Crystallization: Confined Crystallization in an Ordered Lamellar Phase of PEO-b-PS Diblock Copolymer,” Polymer 42, 5829ff. (2001).
  168. K. Asakawa and T. Hiraoka, “Nanopatterning with Microdomains of Block Copolymers Using Reactive-Ion Etching Selectivity,” Jpn. J. Appl. Phys. 41, 6112–6118 (2002).
  169. C. T. Kresge, M. E. Leonowicz, W. J. Roth, J. C. Vartuli, and J. S. Beck, “Ordered Mesoporous Molecular-Sieves Synthesized by a Liquid-Crystal Template Mechanism,” Nature 359, 710–712 (1992).
  170. R. G. H. Lammertink, M. A. Hempenius, J. E. van den Enk, V. Z. H. Chan, E. L. Thomas, and G. J. Vancso, “Nanostructured Thin Films of Organic–Organometallic Block Copolymers: One-Step Lithography with Poly(Ferrocenylsilanes) by Reactive Ion Etching,” Adv. Mater. 12, 98–103 (2000).
  171. P. F. W. Simon, R. Ulrich, H. W. Spiess, and U. Wiesner, “Block Copolymer–Ceramic Hybrid Materials from Organically Modified Ceramic Precursors,” Chem. Mater. 13, 3464ff. (2001).
  172. H. Jagannathan, M. Deal, Y. Nishi, H. C. Kim, E. M. Freer, L. Sundstrom, T. Topuria, and P. M. Rice, “Templated Germanium Nanowire Synthesis Using Oriented Mesoporous Organosilicate Thin Films,” J. Vac. Sci. Technol. B 24, 2220–2224 (2006).
  173. L. Sundstrom, L. Krupp, E. Delenia, C. Rettner, M. Sanchez, M. W. Hart, H. C. Kim, and Y. Zhang, “Patterning Similar to 20 nm Half-Pitch Lines on Silicon Using a Self-Assembled Organosilicate Etch Mask,” Appl. Phys. Lett. 88, 243107ff. (2006).
  174. M. Park, P. M. Chaikin, R. A. Register, and D. H. Adamson, “Large Area Dense Nanoscale Patterning of Arbitrary Surfaces,” Appl. Phys. Lett. 79, 257ff. (2001).
  175. U. Jeong, D. Y. Ryu, D. H. Kho, J. K. Kim, J. T. Goldbach, D. H. Kim, and T. P. Russell, “Enhancement in the Orientation of the Microdomain in Block Copolymer Thin Films Upon the Addition of Homopolymer,” Adv. Mater. 16, 533–536 (2004).
  176. U. Y. Jeong, D. Y. Ryu, J. K. Kim, D. H. Kim, X. D. Wu, and T. P. Russell, “Precise Control of Nanopore Size in Thin Film Using Mixtures of Asymmetric Block Copolymer and Homopolymer,” Macromolecules 36, 10126–10129 (2003).
  177. E. W. Edwards, M. P. Stoykovich, P. F. Nealey, and H. H. Solak, “Binary Blends of Diblock Copolymers as an Effective Route to Multiple Length Scales in Perfect Directed Self-Assembly of Diblock Copolymer Thin Films,” J. Vac. Sci. Technol. B 24, 340–344 (2006).
  178. E. W. Edwards, M. P. Stoykovich, H. H. Solak, and P. F. Nealey, “Long-Range Order and Orientation of Cylinder-Forming Block Copolymers on Chemically Nanopatterned Striped Surfaces,” Macromolecules 39, 3598–3607 (2006).
  179. J. Bang, S. H. Kim, E. Drockenmuller, M. J. Misner, T. P. Russell, and C. J. Hawker, “Defect-Free Nanoporous Thin Films from ABC Triblock Copolymers,” J. Amer. Chem. Assoc. 128, 7622ff. (2006).


    About IBM    Privacy    Contact