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Advanced Semiconductor LithographyVol. 45, No. 5, 2001
Order No. G322-0228 |
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Advances in lithography for the semiconductor industry will continue to have a major impact on that industry. As circuit dimensions continue to shrink, all aspects of semiconductor lithography face increased challenges. This issue of the IBM Journal of Research and Development contains seven papers that describe recent advances in exposure systems, masks, resists, and novel processes that address these challenges. |
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HTML PDF ASCII |
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Papers may be viewed by clicking on the title of interest |
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Preface |
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George J. Hefferon, Guest Editor |
p. 603 |
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Review of technology for 157-nm lithography |
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A. K. Bates, M. Rothschild, T. M. Bloomstein, T. H. Fedynyshyn, R. R. Kunz, V. Liberman, and M. Switkes |
p. 605 |
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PREVAIL—Electron projection technology approach for next-generation lithography |
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R. S. Dhaliwal, W. A. Enichen, S. D. Golladay, M. S. Gordon, R. A. Kendall, J. E. Lieberman, H. C. Pfeiffer, D. J. Pinckney, C. F. Robinson, J. D. Rockrohr, W. Stickel, and E. V. Tressler |
p. 615 |
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Recent progress in electron-beam resists for advanced mask-making |
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D. R. Medeiros, A. Aviram, C. R. Guarnieri, W.-S. Huang, R. Kwong, C. K. Magg, A. P. Mahorowala, W. M. Moreau, K. E. Petrillo, and M. Angelopoulos |
p. 639 |
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TCAD development for lithography resolution enhancement |
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L. W. Liebmann, S. M. Mansfield, A. K. Wong, M. A. Lavin, W. C. Leipold, and T. G. Dunham |
p. 651 |
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Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists |
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W. D. Hinsberg, F. A. Houle, M. I. Sanchez, and G. M. Wallraff |
p. 667 |
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Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography |
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H. Ito |
p. 683 |
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Printing meets lithography: Soft approaches to high-resolution patterning |
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B. Michel, A. Bernard, A. Bietsch, E. Delamarche, M. Geissler, D. Juncker, H. Kind, J.-P. Renault, H. Rothuizen, H. Schmid, P. Schmidt-Winkel, R. Stutz, and H. Wolf |
p. 697 |
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Recent publications by IBM authors |
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p. 721 |
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Patents |
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p. 731 |
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