Biographical sketches of authors
Peter Vettiger
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (pv@zurich.ibm.com).
Mr. Vettiger received a degree in communications technology and electronics engineering in 1966 from the Zurich University of Applied Science. Since 1967, he has worked as a Research Staff Member and project manager at the IBM Zurich Research Laboratory. In 1979, he established and led micro- and nanofabrication within the Laboratory's Technology Department for the fabrication of superconducting, electronic, and opto-electronic devices and circuits. Mr. Vettiger spent extended time at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York, and at the IBM semiconductor plant in East Fishkill, New York. Since 1995, he has been manager of the Micro/Nanomechanics group within the Science and Technology Department. His current interests and research activities are focused on micro/nanomechanical devices and systems for scanning probe data storage, including aspects of fabrication and electronics integration for future VLSI N(M)EMS. Mr. Vettiger holds several IBM Outstanding and Invention Achievement Awards; he is a Senior Member of IEEE and a member of the IBM Technical Academy.
Michel Despont
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (dpt@zurich.ibm.com).
Dr. Despont received a degree in microtechnology from the Swiss Federal Institute of Technology in Lausanne in 1993 and a Ph.D. degree in physics from the Institute of Microtechnology, University of Neuch|$$|Axatel, in 1996, with a dissertation on the microfabrication of miniaturized electron lenses. After a postdoctoral fellowship in 1996 at the IBM Zurich Research Laboratory, where he worked on the development of various cantilever-based sensors, he spent one year as a visiting scientist at the Seiko Instruments Research Laboratory in Japan. Since his return to the IBM Zurich Research Laboratory, Dr. Despont's research has been focused on the development of micro- and nanomechanical devices.
Ute Drechsler
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (dre@zurich.ibm.com).
Ms. Drechsler is a processing engineer in the Science and Technology Department of the IBM Zurich Research Laboratory. She originally joined the IBM semiconductor plant in Sindelfingen, Germany, in 1983, starting with a three-year course of study in chemistry. Afterward she worked in the fabrication line for multilayer ceramic packaging, where she was promoted to Section Head in 1993. In 1996, Ms. Drechsler joined the Micro/Nanomechanics group at the IBM Zurich Research Laboratory, working on silicon micromachining and processing techniques for Millipede array chips and processing-related work for other department projects. She is currently responsible for the organization and operation of the department cleanroom.
Urs Dürig
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (drg@zurich.ibm.com).
Dr. Dürig received a degree in experimental physics and a Ph.D. degree from the Swiss Federal Institute of Technology, Zurich, in 1979 and 1984, respectively. He then spent a postdoctoral fellowship at the IBM Zurich Research Laboratory, working on near-field optical microscopy in the group of D. W. Pohl; he became a Research Staff Member in 1986. He then worked in the field of scanning tunneling and force microscopy, investigating metallic adhesion, growth morphology of magnetic thin films, and surface melting. In addition, Dr. Dürig made significant contributions to the instrumental development of dynamic force microscopy. In 1997, he joined the Micro/Nanomechanics group working on instrumental aspects and on characterizing tippolymer interactions.
Walter Häberle
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (wha@zurich.ibm.com).
Mr. Häberle is a Development Engineer in the Science and Technology Department of the IBM Zurich Research Laboratory. In 1974, he joined the IBM semiconductor plant in Sindelfingen, Germany, for his education in physics. He was later promoted to Group Leader in the Quality Control Department of the semiconductor line. In 1987, he joined the IBM physics group of Prof. G. K. Binnig at the University of Munich, where he contributed to the development of AFMs for applications to liquids for investigating living cells. In 1995, Mr. Häberle transferred to the IBM Zurich Research Laboratory, where he was responsible for prototyping a new low-cost AFM instrument with good price/performance, which has since been commercialized by Seiko Instruments, Japan. In addition, he has been involved in various aspects of Millipede, including writing/reading experiments and scanning approaches for the 32 × 32 array chip.
Mark I. Lutwyche
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (mlu@zurich.ibm.com).
Dr. Lutwyche received a B.Sc. degree in physics from Imperial College, London, in 1986, and a Ph.D. from Cambridge University in 1992 in micromechanics and electron-beam lithography. Afterward he joined the Hitachi Advanced Research Laboratory in Japan for four years as a Visiting Scientist. During this time, he worked on a combined transmission electron microscope/scanning tunneling microscope, micromechanics, nanostructures, and single-electron transistors. In 1997, Dr. Lutwyche joined the Micro/Nanomechanics group of the IBM Zurich Research Laboratory as a Research Staff Member working on atomic force microscope systems for future data storage.
Hugo E. Rothuizen
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (rth@zurich.ibm.com).
Dr. Rothuizen received a degree in applied physics in 1989 and a Ph.D. degree in 1994 from the Swiss Federal Institute of Technology in Lausanne for work on selective area epitaxial growth of IIIV semiconductor materials. Since becoming a Research Staff Member at the IBM Zurich Research Laboratory in 1996, he has worked on the fabrication of various ultrasmall structures using electron-beam lithography. Dr. Rothuizen is currently involved in the development of micromechanical sensors and actuators for data-storage applications.
Richard Stutz
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (ris@zurich.ibm.com).
Mr. Stutz is a Senior Technical Specialist in the Micro/Nanomechanics group of the IBM Zurich Research Laboratory, which he joined in 1998. His current technical responsibilities and interests include electroplating, plasma sputter deposition, surface modification by stamping techniques, and focused ion beam (FIB) machining for micromechanical devices. Prior to joining IBM, Mr. Stutz was responsible for the fabrication and technological aspects of holography, integrated, and micro-optical systems while a member of the technical staff of the Paul Scherrer Institute (PSI), and the Centre Suisse d'Electronique et de Microtechnique (CSEM) in Zurich, Switzerland.
Roland Widmer
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (rwi@zurich.ibm.com).
Mr. Widmer joined the Micro/Nanomechanics group of the IBM Zurich Research Laboratory as a Senior Technical Specialist in 1998. His responsibilities and interests involve fabrication techniques for silicon micromechanical devices, with a focus on reactive ion etching including very high aspect ratio and deep silicon etching. Before joining IBM, he was a member of the technical staff at the RCA Research Laboratory, Paul Scherrer Institute (PSI), and the Centre Suisse d'Electronique et de Microtechnique (CSEM) in Zurich, Switzerland, where he was responsible for thin-film fabrication techniques such as evaporation, sputtering, and reactive ion etching of various materials for submicron electronic and opto-electronic devices.
Gerd K. Binnig
IBM Research, Zurich Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland (gbi@zurich.ibm.com).
Dr. Binnig studied physics at the University of Frankfurt, Germany, where he completed his Ph.D. in 1978 with a dissertation on superconductivity. Since 1978, he has been a Research Staff Member of the IBM Zurich Research Laboratory, interrupted by a sabbatical at the IBM Almaden Research Center in San Jose, California (1985/1986), and a guest professorship at Stanford University (19851988). From 1987 to 1995, he headed the IBM physics group at the University of Munich, from which he received an honorary professorship in 1987. His main fields of activity during that time were scanning tunneling microscopy and atomic force microscopy. For the development of the scanning tunneling microscope, which he invented together with Heinrich Rohrer, Dr. Binnig received numerous awards, including the Nobel Prize in Physics in 1986. His current fields of research include micro- and nanosystem techniques and the theory of “Fractal Darwinism,” which he developed to describe complex systems.
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