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by R. D. Isaac |
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References
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Lloyd R. Harriott, “Scattering with Angular Limitation Projection Electron Beam Lithography for Suboptical Lithography,” J. Vac. Sci. Technol. B 15, No. 6, 21302135 (November/December 1997).
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J. H. Stathis and D. J. DiMaria, “Reliability Properties for Ultra-Thin Oxides at Low Voltage,” Proceedings of the 1998 International Electron Devices Meeting, IEEE, Piscataway, NJ, 1998, pp. 7.2.17.2.4.
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J. D. Meindl, “Gigascale Integration: Is the Sky the Limit?” IEEE Circuits & Devices 12, 19 (November 1996).
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Y. Taur, Y.-J. Mii, D. J. Frank, H. S. Wong, D. A. Buchanan, S. J. Wind, S. A. Rishton, G. A. Sai-Halasz, and E. J. Nowak, “CMOS Scaling into the 21st Century: 0.1 µm and Beyond,” IBM J. Res. Develop. 39, No. 1/2, 245260 (1995).
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T. N. Theis, “The Future of Interconnection Technology,” IBM J. Res. Develop. 44, No. 3, 379390 (2000, this issue).
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