0018-8646/99/$3.00 (C) 1999 IBM Subject index for papers in Volume 43 Each index entry below is accompanied by an author's name and a page number; the author index contains the title of the paper and the names of coauthors, if any. Algorithms Evaluation of branch-prediction methods on traces from commercial applications 579 Hilgendorf Analytical models Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Arithmetic and logical unit design Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic 723 Abbott The S/390 G5 floating-point unit 707 Schwarz Capacitance (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Channel subsystem architecture Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 807 DeCusatis Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex 855 Rao Self-timed interface for S/390 I/O subsystem interconnection 829 Hoke The Integrated Cluster Bus for the IBM S/390 Parallel Sysplex 795 Gregg Chemical vapor deposition High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits 109 Nguyen Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits 5 Cote Plasma-deposited diamondlike carbon and related materials 147 Grill Chemistry and chemical engineering Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Circuit and device technology Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook CMOS Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors 681 Averill Custom S/390 G5 and G6 microprocessors 671 Check Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer MCM technology and design for the S/390 G5 system 621 Katopis Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook RAS strategy for IBM S/390 G5 and G6 875 Mueller S/390 G5 CMOS microprocessor diagnostics 899 Song Computer system availability Event monitoring in highly complex hardware systems 889 Buechner RAS strategy for IBM S/390 G5 and G6 875 Mueller Contamination Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Cryptography S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations 777 Yeh S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor 761 Easter Data compression Single-pass constant- and variable-bit-rate MPEG-2 video compression 489 Mohsenian Data transmission Design of an MPEG-2 transport demultiplexor core 521 Anderson Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Design verification PLL modeling and verification in a cycle-simulation environment 915 Van Huben Device design Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Dielectrics (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits 109 Nguyen Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits 5 Cote Plasma-assisted oxidation, anodization, and nitridation of silicon 127 Hess Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Diffusion Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Electrochemistry Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt ESCON architecture Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 807 DeCusatis Etching Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Fabrication of magnetic recording heads and dry etching of head materials 89 Hsiao Plasma-etching processes for ULSI semiconductor circuits 39 Armacost Plasma processing damage in etching and deposition 103 Fonash Surface science issues in plasma etching 181 Oehrlein Fabrication Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Fault tolerance IBM S/390 Parallel Enterprise Server G5 fault tolerance: A historical perspective 863 Spainhower Fiber optics Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 807 DeCusatis Films Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Films, oxide (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Films, semiconductor Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays 73 Kuo Films, thin (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Fabrication of magnetic recording heads and dry etching of head materials 89 Hsiao Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits 5 Cote Plasma-deposited diamondlike carbon and related materials 147 Grill Plasma-etching processes for ULSI semiconductor circuits 39 Armacost Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Surface science issues in plasma etching 181 Oehrlein Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky I/O devices, systems, and technology Self-timed interface for S/390 I/O subsystem interconnection 829 Hoke IBM System/390 Parallel Enterprise Server Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic 723 Abbott Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors 681 Averill Custom S/390 G5 and G6 microprocessors 671 Check Event monitoring in highly complex hardware systems 889 Buechner Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 807 DeCusatis IBM S/390 Parallel Enterprise Server G5 fault tolerance: A historical perspective 863 Spainhower IBM S/390 storage hierarchy- G5 and G6 performance considerations 847 Jackson Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex 855 Rao MCM technology and design for the S/390 G5 system 621 Katopis PLL modeling and verification in a cycle-simulation environment 915 Van Huben RAS strategy for IBM S/390 G5 and G6 875 Mueller S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations 777 Yeh S/390 G5 CMOS microprocessor diagnostics 899 Song S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor 761 Easter Self-timed interface for S/390 I/O subsystem interconnection 829 Hoke System performance management for the S/390 Parallel Enterprise Server G5 651 Rizzolo The Integrated Cluster Bus for the IBM S/390 Parallel Sysplex 795 Gregg The S/390 G5 floating-point unit 707 Schwarz The S/390 G5/G6 binodal cache 661 Turgeon Image processing A framework for programmable overlay multimedia networks 555 Manohar Design of an MPEG-2 transport demultiplexor core 521 Anderson Memory reduction for HDTV decoders 545 Lam Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Requirements for motion-estimation search range in MPEG-2 coded video 453 Gonzales Single-pass constant- and variable-bit-rate MPEG-2 video compression 489 Mohsenian Statistical multiplexing using MPEG-2 video encoders 511 Boroczky Two-pass MPEG-2 variable-bit-rate encoding 471 Westerink Imaging technology Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays 73 Kuo Inductance Plasma processing damage in etching and deposition 103 Fonash Insulators (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Interconnection technology Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 807 DeCusatis Interfaces Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Logic design and technology Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic 723 Abbott Evaluation of branch-prediction methods on traces from commercial applications 579 Hilgendorf S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations 777 Yeh S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor 761 Easter The S/390 G5 floating-point unit 707 Schwarz Machine computation and data analysis Evaluation of branch-prediction methods on traces from commercial applications 579 Hilgendorf Magnetic recording Fabrication of magnetic recording heads and dry etching of head materials 89 Hsiao Manufacturing Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Sputter deposition for semiconductor manufacturing 163 Rossnagel Materials Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Materials technology (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Surface science issues in plasma etching 181 Oehrlein Mathematical functions and techniques Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic 723 Abbott Measurement Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Memory (computer) design and technology (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Memory, cache The S/390 G5/G6 binodal cache 661 Turgeon Memory, random-access (Ba,Sr)TiO[sub]3[/sub] dielectrics for future stacked-capacitor DRAM 367 Kotecki Microelectronics Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors 681 Averill Custom S/390 G5 and G6 microprocessors 671 Check MCM technology and design for the S/390 G5 system 621 Katopis System performance management for the S/390 Parallel Enterprise Server G5 651 Rizzolo Microprocessor systems and applications Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors 681 Averill Custom S/390 G5 and G6 microprocessors 671 Check Models and modeling Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Modeling and simulation methods for plasma processing 199 Hamaguchi PLL modeling and verification in a cycle-simulation environment 915 Van Huben Multilayers Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Multimedia A framework for programmable overlay multimedia networks 555 Manohar Design of an MPEG-2 transport demultiplexor core 521 Anderson Memory reduction for HDTV decoders 545 Lam Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Requirements for motion-estimation search range in MPEG-2 coded video 453 Gonzales Single-pass constant- and variable-bit-rate MPEG-2 video compression 489 Mohsenian Statistical multiplexing using MPEG-2 video encoders 511 Boroczky Two-pass MPEG-2 variable-bit-rate encoding 471 Westerink Multiplexing Design of an MPEG-2 transport demultiplexor core 521 Anderson Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Statistical multiplexing using MPEG-2 video encoders 511 Boroczky Nanoscale structures and devices Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Nitridation Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Oxynitridation Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Oxynitride Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Performance analysis Evaluation of branch-prediction methods on traces from commercial applications 579 Hilgendorf Event monitoring in highly complex hardware systems 889 Buechner IBM S/390 storage hierarchy-G5 and G6 performance considerations 847 Jackson Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex 855 Rao S/390 G5 CMOS microprocessor diagnostics 899 Song Photothermal processes Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Physical chemistry Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Physics, solid state Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Plasma processing Fabrication of magnetic recording heads and dry etching of head materials 89 Hsiao High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits 109 Nguyen Modeling and simulation methods for plasma processing 199 Hamaguchi Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits 5 Cote Plasma-assisted oxidation, anodization, and nitridation of silicon 127 Hess Plasma-deposited diamondlike carbon and related materials 147 Grill Plasma-etching processes for ULSI semiconductor circuits 39 Armacost Plasma processing damage in etching and deposition 103 Fonash Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays 73 Kuo Sputter deposition for semiconductor manufacturing 163 Rossnagel Surface science issues in plasma etching 181 Oehrlein Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Process control and development Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Quantum theory and effects Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Reliability Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook RAS strategy for IBM S/390 G5 and G6 875 Mueller Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Semiconductor technology Cost-effective cleaning and high-quality thin gate oxides 339 Heyns High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits 109 Nguyen Modeling and simulation methods for plasma processing 199 Hamaguchi Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits 5 Cote Plasma-assisted oxidation, anodization, and nitridation of silicon 127 Hess Plasma-etching processes for ULSI semiconductor circuits 39 Armacost Plasma processing damage in etching and deposition 103 Fonash Sputter deposition for semiconductor manufacturing 163 Rossnagel Signal processing Design of an MPEG-2 transport demultiplexor core 521 Anderson Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Requirements for motion-estimation search range in MPEG-2 coded video 453 Gonzales Single-pass constant- and variable-bit-rate MPEG-2 video compression 489 Mohsenian Statistical multiplexing using MPEG-2 video encoders 511 Boroczky Two-pass MPEG-2 variable-bit-rate encoding 471 Westerink Silicon Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Plasma-assisted oxidation, anodization, and nitridation of silicon 127 Hess Plasma-etching processes for ULSI semiconductor circuits 39 Armacost Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Silicon dioxide Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations 393 Hook Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Silicon nitride Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Nitrous oxide (N[sub]2[/sub]O) processing for silicon oxynitride gate dielectrics 287 Ellis Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Silicon oxidation Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Sputtering Sputter deposition for semiconductor manufacturing 163 Rossnagel Storage hierarchies IBM S/390 storage hierarchy-G5 and G6 performance considerations 847 Jackson The S/390 G5/G6 binodal cache 661 Turgeon Surface effects Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Modeling and simulation methods for plasma processing 199 Hamaguchi Surface passivation Characterization of silicon surface preparation processes for advanced gate dielectrics 351 Okorn-Schmidt Growth and characterization of ultrathin nitrided silicon oxide films 265 Gusev Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability 301 Lucovsky Surface science Cost-effective cleaning and high-quality thin gate oxides 339 Heyns Testing Key measurements of ultrathin gate dielectric reliability and in-line monitoring 407 Abadeer Thickness measurement Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Transistors Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Scaling the gate dielectric: Materials, integration, and reliability 245 Buchanan Titanium dioxide (TiO[sub]2[/sub])-based gate insulators 383 Campbell Transistors, thin film (TFTs) Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays 73 Kuo Tunneling Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides 327 Lo Video signals A framework for programmable overlay multimedia networks 555 Manohar Design of an MPEG-2 transport demultiplexor core 521 Anderson Memory reduction for HDTV decoders 545 Lam Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor 533 Reed Requirements for motion-estimation search range in MPEG-2 coded video 453 Gonzales Single-pass constant- and variable-bit-rate MPEG-2 video compression 489 Mohsenian Statistical multiplexing using MPEG-2 video encoders 511 Boroczky Two-pass MPEG-2 variable-bit-rate encoding 471 Westerink Wear Plasma-deposited diamondlike carbon and related materials 147 Grill