Subject index for papers in Volume 43

Each index entry below is accompanied by an author's name and a page number; the author index contains the title of the paper and the names of coauthors, if any.

Algorithms Evaluation of branch-prediction methods on traces from commercial applications suite	Hilgendorf	579
Analytical models Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor suite	Reed	533
Arithmetic and logical unit design Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic suite	Abbott	723
The S/390 G5 floating-point unit	Schwarz	707
Capacitance (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Channel subsystem architecture Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 suite	DeCusatis	807
Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex	Rao	855
Self-timed interface for S/390 I/O subsystem interconnection	Hoke	829
The Integrated Cluster Bus for the IBM S/390 Parallel Sysplex	Gregg	795
Chemical vapor deposition High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits suite	Nguyen	109
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits	Cote	5
Plasma-deposited diamondlike carbon and related materials	Grill	147
Chemistry and chemical engineering Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics	Ellis	287
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Circuit and device technology Key measurements of ultrathin gate dielectric reliability and in-line monitoring suite	Abadeer	407
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
CMOS Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors suite	Averill	681
Custom S/390 G5 and G6 microprocessors	Check	671
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
MCM technology and design for the S/390 G5 system	Katopis	621
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
RAS strategy for IBM S/390 G5 and G6	Mueller	875
S/390 G5 CMOS microprocessor diagnostics	Song	899
Computer system availability Event monitoring in highly complex hardware systems suite	Buechner	889
RAS strategy for IBM S/390 G5 and G6	Mueller	875
Contamination Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Cryptography S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations suite	Yeh	777
S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor	Easter	761
Data compression Single-pass constant- and variable-bit-rate MPEG-2 video compression suite	Mohsenian	489
Data transmission Design of an MPEG-2 transport demultiplexor core suite	Anderson	521
Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor	Reed	533
Design verification PLL modeling and verification in a cycle-simulation environment suite	Van Huben	915
Device design Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations suite	Hook	393
Dielectrics (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Characterization of silicon surface preparation processes for advanced gate dielectrics	Okorn-Schmidt	351
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits	Nguyen	109
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics	Ellis	287
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits	Cote	5
Plasma-assisted oxidation, anodization, and nitridation of silicon	Hess	127
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Diffusion Scaling the gate dielectric: Materials, integration, and reliability suite	Buchanan	245
Electrochemistry Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
ESCON architecture Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 suite	DeCusatis	807
Etching Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
Fabrication of magnetic recording heads and dry etching of head materials	Hsiao	89
Plasma-etching processes for ULSI semiconductor circuits	Armacost	39
Plasma processing damage in etching and deposition	Fonash	103
Surface science issues in plasma etching	Oehrlein	181
Fabrication Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability suite	Lucovsky	301
Fault tolerance IBM S/390 Parallel Enterprise Server G5 fault tolerance: A historical perspective suite	Spainhower	863
Fiber optics Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 suite	DeCusatis	807
Films Titanium dioxide (TiO2)-based gate insulators suite	Campbell	383
Films, oxide (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Films, semiconductor Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays suite	Kuo	73
Films, thin (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Fabrication of magnetic recording heads and dry etching of head materials	Hsiao	89
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides	Lo	327
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits	Cote	5
Plasma-deposited diamondlike carbon and related materials	Grill	147
Plasma-etching processes for ULSI semiconductor circuits	Armacost	39
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Surface science issues in plasma etching	Oehrlein	181
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
I/O devices, systems, and technology Self-timed interface for S/390 I/O subsystem interconnection suite	Hoke	829
IBM System/390 Parallel Enterprise Server Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic suite	Abbott	723
Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors	Averill	681
Custom S/390 G5 and G6 microprocessors	Check	671
Event monitoring in highly complex hardware systems	Buechner	889
Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5	DeCusatis	807
IBM S/390 Parallel Enterprise Server G5 fault tolerance: A historical perspective	Spainhower	863
IBM S/390 storage hierarchy– G5 and G6 performance considerations	Jackson	847
Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex	Rao	855
MCM technology and design for the S/390 G5 system	Katopis	621
PLL modeling and verification in a cycle-simulation environment	Van Huben	915
RAS strategy for IBM S/390 G5 and G6	Mueller	875
S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations	Yeh	777
S/390 G5 CMOS microprocessor diagnostics	Song	899
S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor	Easter	761
Self-timed interface for S/390 I/O subsystem interconnection	Hoke	829
System performance management for the S/390 Parallel Enterprise Server G5	Rizzolo	651
The Integrated Cluster Bus for the IBM S/390 Parallel Sysplex	Gregg	795
The S/390 G5 floating-point unit	Schwarz	707
The S/390 G5/G6 binodal cache	Turgeon	661
Image processing A framework for programmable overlay multimedia networks suite	Manohar	555
Design of an MPEG-2 transport demultiplexor core	Anderson	521
Memory reduction for HDTV decoders	Lam	545
Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor	Reed	533
Requirements for motion-estimation search range in MPEG-2 coded video	Gonzales	453
Single-pass constant- and variable-bit-rate MPEG-2 video compression	Mohsenian	489
Statistical multiplexing using MPEG-2 video encoders	Böröczky	511
Two-pass MPEG-2 variable-bit-rate encoding	Westerink	471
Imaging technology Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays suite	Kuo	73
Inductance Plasma processing damage in etching and deposition suite	Fonash	103
Insulators (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Interconnection technology Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5 suite	DeCusatis	807
Interfaces Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Logic design and technology Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic suite	Abbott	723
Evaluation of branch-prediction methods on traces from commercial applications	Hilgendorf	579
S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations	Yeh	777
S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor	Easter	761
The S/390 G5 floating-point unit	Schwarz	707
Machine computation and data analysis Evaluation of branch-prediction methods on traces from commercial applications suite	Hilgendorf	579
Magnetic recording Fabrication of magnetic recording heads and dry etching of head materials suite	Hsiao	89
Manufacturing Key measurements of ultrathin gate dielectric reliability and in-line monitoring suite	Abadeer	407
Sputter deposition for semiconductor manufacturing	Rossnagel	163
Materials Growth and characterization of ultrathin nitrided silicon oxide films suite	Gusev	265
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Materials technology (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Cost-effective cleaning and high-quality thin gate oxides	Heyns	339
Surface science issues in plasma etching	Oehrlein	181
Mathematical functions and techniques Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic suite	Abbott	723
Measurement Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Memory (computer) design and technology (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Memory, cache The S/390 G5/G6 binodal cache suite	Turgeon	661
Memory, random-access (Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM suite	Kotecki	367
Microelectronics Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors suite	Averill	681
Custom S/390 G5 and G6 microprocessors	Check	671
MCM technology and design for the S/390 G5 system	Katopis	621
System performance management for the S/390 Parallel Enterprise Server G5	Rizzolo	651
Microprocessor systems and applications Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors suite	Averill	681
Custom S/390 G5 and G6 microprocessors	Check	671
Models and modeling Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Modeling and simulation methods for plasma processing	Hamaguchi	199
PLL modeling and verification in a cycle-simulation environment	Van Huben	915
Multilayers Titanium dioxide (TiO2)-based gate insulators suite	Campbell	383
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Multimedia A framework for programmable overlay multimedia networks suite	Manohar	555
Design of an MPEG-2 transport demultiplexor core	Anderson	521
Memory reduction for HDTV decoders	Lam	545
Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor	Reed	533
Requirements for motion-estimation search range in MPEG-2 coded video	Gonzales	453
Single-pass constant- and variable-bit-rate MPEG-2 video compression	Mohsenian	489
Statistical multiplexing using MPEG-2 video encoders	Böröczky	511
Two-pass MPEG-2 variable-bit-rate encoding	Westerink	471
Multiplexing Design of an MPEG-2 transport demultiplexor core suite	Anderson	521
Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor	Reed	533
Statistical multiplexing using MPEG-2 video encoders	Böröczky	511
Nanoscale structures and devices Growth and characterization of ultrathin nitrided silicon oxide films suite	Gusev	265
Nitridation Growth and characterization of ultrathin nitrided silicon oxide films suite	Gusev	265
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics	Ellis	287
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Oxynitridation Growth and characterization of ultrathin nitrided silicon oxide films suite	Gusev	265
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics	Ellis	287
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Oxynitride Growth and characterization of ultrathin nitrided silicon oxide films suite	Gusev	265
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics	Ellis	287
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Performance analysis Evaluation of branch-prediction methods on traces from commercial applications suite	Hilgendorf	579
Event monitoring in highly complex hardware systems	Buechner	889
IBM S/390 storage hierarchy–G5 and G6 performance considerations	Jackson	847
Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex	Rao	855
S/390 G5 CMOS microprocessor diagnostics	Song	899
Photothermal processes Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics suite	Ellis	287
Physical chemistry Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
Cost-effective cleaning and high-quality thin gate oxides	Heyns	339
Physics, solid state Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Plasma processing Fabrication of magnetic recording heads and dry etching of head materials suite	Hsiao	89
High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits	Nguyen	109
Modeling and simulation methods for plasma processing	Hamaguchi	199
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits	Cote	5
Plasma-assisted oxidation, anodization, and nitridation of silicon	Hess	127
Plasma-deposited diamondlike carbon and related materials	Grill	147
Plasma-etching processes for ULSI semiconductor circuits	Armacost	39
Plasma processing damage in etching and deposition	Fonash	103
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays	Kuo	73
Sputter deposition for semiconductor manufacturing	Rossnagel	163
Surface science issues in plasma etching	Oehrlein	181
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Process control and development Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Quantum theory and effects Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Reliability Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
RAS strategy for IBM S/390 G5 and G6	Mueller	875
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Semiconductor technology Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits	Nguyen	109
Modeling and simulation methods for plasma processing	Hamaguchi	199
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits	Cote	5
Plasma-assisted oxidation, anodization, and nitridation of silicon	Hess	127
Plasma-etching processes for ULSI semiconductor circuits	Armacost	39
Plasma processing damage in etching and deposition	Fonash	103
Sputter deposition for semiconductor manufacturing	Rossnagel	163
Signal processing Design of an MPEG-2 transport demultiplexor core suite	Anderson	521
Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor	Reed	533
Requirements for motion-estimation search range in MPEG-2 coded video	Gonzales	453
Single-pass constant- and variable-bit-rate MPEG-2 video compression	Mohsenian	489
Statistical multiplexing using MPEG-2 video encoders	Böröczky	511
Two-pass MPEG-2 variable-bit-rate encoding	Westerink	471
Silicon Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Plasma-assisted oxidation, anodization, and nitridation of silicon	Hess	127
Plasma-etching processes for ULSI semiconductor circuits	Armacost	39
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Silicon dioxide Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides	Lo	327
Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations	Hook	393
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Silicon nitride Growth and characterization of ultrathin nitrided silicon oxide films suite	Gusev	265
Key measurements of ultrathin gate dielectric reliability and in-line monitoring	Abadeer	407
Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics	Ellis	287
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Silicon oxidation Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Sputtering Sputter deposition for semiconductor manufacturing suite	Rossnagel	163
Storage hierarchies IBM S/390 storage hierarchy–G5 and G6 performance considerations suite	Jackson	847
The S/390 G5/G6 binodal cache	Turgeon	661
Surface effects Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
Modeling and simulation methods for plasma processing	Hamaguchi	199
Surface passivation Characterization of silicon surface preparation processes for advanced gate dielectrics suite	Okorn-Schmidt	351
Growth and characterization of ultrathin nitrided silicon oxide films	Gusev	265
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability	Lucovsky	301
Surface science Cost-effective cleaning and high-quality thin gate oxides suite	Heyns	339
Testing Key measurements of ultrathin gate dielectric reliability and in-line monitoring suite	Abadeer	407
Thickness measurement Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Transistors Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Scaling the gate dielectric: Materials, integration, and reliability	Buchanan	245
Titanium dioxide (TiO2)-based gate insulators	Campbell	383
Transistors, thin film (TFTs) Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays suite	Kuo	73
Tunneling Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides suite	Lo	327
Video signals A framework for programmable overlay multimedia networks suite	Manohar	555
Design of an MPEG-2 transport demultiplexor core	Anderson	521
Memory reduction for HDTV decoders	Lam	545
Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor	Reed	533
Requirements for motion-estimation search range in MPEG-2 coded video	Gonzales	453
Single-pass constant- and variable-bit-rate MPEG-2 video compression	Mohsenian	489
Statistical multiplexing using MPEG-2 video encoders	Böröczky	511
Two-pass MPEG-2 variable-bit-rate encoding	Westerink	471
Plasma-deposited diamondlike carbon and related materials	Grill	147