Biographical sketches of authors
Marc M. Heyns
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (heyns@imec.be).
Dr. Heyns received the M.Sc. degree in electrical and mechanical engineering in 1979 and the Ph.D. degree in 1986, both from the Katholieke Universiteit Leuven, Belgium. In 1986 he joined IMEC, where he is now responsible for a research group working on Ultra Clean Processing Technology, Environment, Safety and Health issues in IC production (ES&H), advanced gate insulators, dielectrics deposited with LPCVD and PECVD, chemical- mechanical polishing (CMP), and EPI deposition.
Twan Bearda
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (beard@imec.be).
Mr. Bearda received the M.Sc. degree at the Twente University of Technology in the Netherlands. He is currently working in the Ultra Clean Processing (UCP) group at IMEC. His areas of interest include the effects of contamination and substrate defects on gate-oxide integrity, yield measurements, and statistical yield analysis.
Ingrid Cornelissen
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (cornelis@imec.be).
Ms. Cornelissen graduated as an engineer in chemistry from the Katholieke Industriele Hogeschool Limburg (KIHL), Belgium, in 1994; she subsequently joined the UCP group at IMEC, where she works on the development and implementation of wet cleaning technologies.
Stefan De Gendt
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (degendt@imec.be).
Dr. De Gendt joined IMEC in 1996. He received his M.Sc. and Ph.D. degrees in chemistry from the University of Antwerp, Belgium, in 1989 and 1996, respectively. Since 1996 he has worked in the UCP group at IMEC; his research interests involve ozone-cleaning technology and analytical metrology for contamination control.
Robin Degraeve
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (degraeve@imec.be).
Dr. Degraeve received the M.Sc. degree in electrical and mechanical engineering from the University of Ghent, Belgium, in 1992, subsequently joining the Reliability Physics group at IMEC. In 1998 he received his Ph.D. from the Katholieke Universiteit Leuven, Belgium. His present interests and activities cover hot-carrier reliability issues in MOSFETs, the physics of breakdown phenomena in oxides, and the reliability of ultrathin oxide layers for VLSI technologies.
Guido Groeseneken
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (groeseneken@imec.be).
Dr. Groeseneken received the M.Sc. degree in electrical and mechanical engineering in 1980 and the Ph.D. degree in 1986, both from the Katholieke Universiteit Leuven, Belgium. In 1987 he joined IMEC, where he now heads the research group on reliability physics for submicron technologies. His research activities cover nonvolatile memories, the reliability physics of VLSI technology, hot-carrier effects in MOSFETs, time-dependent dielectric breakdown of oxides, and ESD protection and testing.
Conny Kenens
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (kenens@imec.be).
Ms. Kenens received her M.Sc. degree in chemistry from the Katholieke Universiteit Leuven, Belgium, in 1992. During the following two years she focused on environmental protection at the same university. In 1995 she joined IMEC, where she is currently working toward a Ph.D. in chemistry.
D. Martin Knotter
Philips Research, Eindhoven, Netherlands (knotter@natlab.research.philips.com).
Mr. Knotter received the M.Sc. degree in organic chemistry from the University of Amsterdam, Netherlands, in 1986 and began his Ph.D. study at the University of Utrecht. In 1990 he joined the Philips Research Laboratories, where in 1995 he became project leader of Surface Preparation in the Semiconductor Process Modules Department. He is responsible for the coordination of the silicon cleaning activities at Philips and works part-time in the UCP group at IMEC.
Lee M. Loewenstein
Texas Instruments, 13500 North Central Expressway, Dallas, Texas 75243 (loewenst@imec.be).
Dr. Loewenstein is a Senior Member of Technical Staff at Texas Instruments. His work has centered on isotropic film removal processes and wafer cleaning. Since 1996 he has been TI's assignee to the IMEC UCP program, where he has been studying metal contamination of the silicon surface. Dr. Loewenstein received his Ph.D. in chemistry in 1984 from Harvard University.
Paul W. Mertens
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (mertensp@imec.be).
Mr. Mertens is section head of Ultra Clean Processing at IMEC. His research interests involve cleaning technology, silicon wafer quality, novel gate-stack technologies, and manufacturing science. He has authored and coauthored more than 100 scientific and technical papers on the matter and has presented at several international conferences.
Sofie Mertens
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (mertenss@imec.be).
Ms. Mertens graduated as an engineer in chemistry, option polymer technology, in 1991. She subsequently joined the UCP group at IMEC, where she works on process development in the furnace and CVD area.
Marc Meuris
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (meuris@imec.be).
Dr. Meuris has worked at IMEC since 1984, beginning in the GaAs processing group. In 1986 he joined the analysis group, where he developed SIMS analysis procedures. Since 1990 he has worked in the UCP group, concentrating on cleaning technology. Since 1997 he has also been responsible for the coordination of CMP research at IMEC. Dr. Meuris received his B.S. and Ph.D. degrees in physics from the Katholieke Universiteit Leuven, Belgium, in 1983 and 1990, respectively.
Tanya Nigam
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (nigam@imec.be).
Ms. Nigam received the M.Sc. degree in physics from the Indian Institute of Technology (IIT), Kanpur, in 1994 and a second M.Sc. in electronic engineering from the Katholieke Universiteit Leuven, Belgium, in 1995. Currently she is pursuing her Ph.D. degree in the area of ultrathin oxides in the UCP group at IMEC.
Marc Schaekers
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (schaekers@imec.be).
Dr. Schaekers studied chemistry at the Katholieke Universiteit Leuven, Belgium, where he received his Ph.D. in 1985. After a stay at the University of Wuppertal, Germany, he joined IMEC in 1987. He has been in charge of process development in the furnace and CVD area, primarily on dielectrics deposited with LPCVD and PECVD.
Ivo Teerlinck
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (teerlinc@imec.be).
Mr. Teerlinck graduated as an engineer in chemistry from the Katholieke Hogeschool Limburg, Belgium, in 1994, joining IMEC that same year. In 1996 he received the M.Sc. degree in chemistry from the Universiteit Gent, Belgium, and is currently working toward a Ph.D. degree. His research is primarily directed toward electrochemistry.
Wilfried Vandervorst
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (vdvorst@imec.be).
Dr. Vandervorst received an M.Sc. degree in electrical engineering in 1977 and a Ph.D. in 1983 from the Katholieke Universiteit Leuven, Belgium. From 1983 to 1984 he worked at Bell Northern Research, Ottawa, Canada. In 1984 he joined IMEC, where he is now head of the group responsible for materials characterization. His interests cover fundamental and applied research dealing with materials development and characterization, with an emphasis on ion-solid interactions, doping processes, and scanning probe methods for device characterization. In 1990 Dr. Vandervorst was appointed a Professor at the Katholieke Universiteit Leuven.
Rita Vos
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium (vos@imec.be).
Dr. Vos received the M.Sc. and Ph.D. in physical chemistry at the Katholieke Universiteit Leuven, Belgium, in 1991 and 1995, respectively. She subsequently joined the UCP group at IMEC, where she works in the field of wet cleaning technology.
Klaus Wolke
STEAG MicroTech, Pliezhausen, Germany (100656.757@compuserv.com).
Dr. Wolke studied experimental physics and received his Ph.D. at the University of Munster, Germany, in 1988. He joined the IBM Microelectronics Division at the DRAM manufacturing plant in Germany as a process engineer for dry-etch processes. From 1993 he was section manager for wet processing. In 1995 he became Manager of the Process Application and Development Division at STEAG MicroTech, focusing on the development of critical cleaning processes for the S/C industry.
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