Biographical sketches of authors
Stephen A. Campbell
University of Minnesota, Department of Electrical and Computer Engineering, 200 Union Street, Minneapolis, Minnesota 55455 (Campbell@ece.umn.edu).
Dr. Campbell is a Professor of Electrical and Computer Engineering at the University of Minnesota. He received the Ph.D. in physics from Northwestern University in 1981 and subsequently held several positions related to integrated-circuit process and device development at Unisys. In 1986 he joined the University of Minnesota. His research interests include rapid thermal processing, nanoscale particles in low-pressure processing equipment, and the use of high-permittivity materials in deep-submicron FETs. Professor Campbell is a former Presidential Young Investigator and the author of a textbook on microfabrication, several book chapters, and more than 50 technical papers.
Hyeon-Seag Kim
University of Minnesota, Department of Electrical and Computer Engineering, 200 Union Street, Minneapolis, Minnesota 55455.
Dr. Kim received the B.S. degree in electronic materials engineering from Kwangwoon University and M.S. and Ph.D. degrees in electrical and computer engineering from the University of Minnesota. He is currently with Advanced Micro Devices at Sunnyvale, California, in the Programmable Logic Technology Division (Vantis). His interests have included the reliability and processes of ultrathin and high-permittivity nanometer MOSFETs, and microelectromechanical systems.
David C. Gilmer
Motorola Inc., Advanced Products Research and Development, 3501 Ed Bluestein Boulevard, Austin, Texas 78721 (ra8315@email.sps.mot.com).
Dr. Gilmer received the Ph.D. in chemistry from the University of Minnesota in 1998 and subsequently accepted a position in materials development and integration at Motorola. His research interests include high-permittivity materials in deep-submicron FETs. Dr. Gilmer has authored or coauthored more than ten technical papers.
Boyong He
University of Minnesota, Department of Electrical and Computer Engineering, 200 Union Street, Minneapolis, Minnesota 55455 (bhe@ece.umn.edu).
Mr. He received the B.S. and M.S. degrees in mechanical engineering from Shang Hai Jiao Tong University of P. R. China in 1989 and 1992. In 1997 he received his second M.S. degree in mechanical engineering from the University of Minnesota. Mr. He is currently working toward his Ph.D. in electrical engineering and is expected to graduate in 1999.
Tiezhong Ma
University of Minnesota, Department of Electrical and Computer Engineering, 200 Union Street, Minneapolis, Minnesota 55455 (tma@ece.umn.edu).
Mr. Ma is a Ph.D. candidate student in the Department of Electrical Engineering. He received a bachelor of engineering degree in materials science from Tsinghua University (Beijing, P. R. China). His current research is related to chemical vapor deposition (CVD) and high-dielectric materials as MOSFET gate insulators. He is the author of several technical papers on TiO2 gate insulators, magnetic materials for magnetic refrigeration, and AlN (aluminum nitride) substrates for high-density electronic packaging.
Wayne L. Gladfelter
University of Minnesota, Department of Chemistry, 207 Pleasant Street S.E., Minneapolis, Minnesota 55455 (gladfelt@chem.umn.edu).
Dr. Gladfelter is an Institute of Technology Distinguished Professor of Chemistry at the University of Minnesota. He received his Ph.D. in chemistry from Pennsylvania State University and spent one year as a National Science Foundation postdoctoral fellow at the California Institute of Technology before starting as an Assistant Professor in chemistry at the University of Minnesota in 1979. His research in materials chemistry has focused on understanding the relationship between the chemical mechanism of film formation and the composition and microstructure of the solid-state product. Dr. Gladfelter has extensively studied aluminum CVD and has developed new molecular precursors for Al, AlN, GaN, RuO2, TiO2, and other solids. He is the author of more than 160 publications and holds patents in the area of molecular precursors. Since 1996 he has served as the Associate Director of the Center for Interfacial Engineering, in charge of the Materials Characterization Facility.
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