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IBM Journal of Research and Development  
Volume 43, Numbers 1/2, 1999
Plasma processing
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Fabrication of magnetic recording heads and dry etching of head materials - Author bio

by R. Hsiao

Biographical sketch of author

Michael Armacost IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120 (rhsiao@almaden.ibm.com). Dr. Hsiao is a Senior Engineer/Scientist at the IBM Almaden Research Center. He received a B.S. degree in metallurgical engineering from Beijing University of Science and Technology in 1982 and a Ph.D degree in materials science and engineering from the University of Pennsylvania in 1987. He was a Visiting Scientist at AT&T Bell Laboratories in Murray Hill, New Jersey, from 1985 to 1986. Dr. Hsiao joined IBM in 1986 and has since worked in the Packaging Technology Laboratory in Endicott, New York (1986-1989), the Semiconductor Laboratory, East Fishkill, New York (1990-1992), and the Advanced Magnetic Recording Laboratory in San Jose, California (1993-present). Since 1993, he has been working on developing high-density magnetic recording heads. Dr. Hsiao is an author or coauthor of more than thirty technical papers and invention disclosures; he holds more than thirty issued and pending U.S. patents. He has received several awards from IBM, including a team award for the development of the IBM high-density magnetic recording head.