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IBM Journal of Research and Development  
Volume 43, Numbers 1/2, 1999
Plasma processing
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Plasma processing damage in etching and deposition - Author bio

by S. J. Fonash

Biographical sketch of author

Stephen J. Fonash Electronic Materials and Processing Research Laboratory, 189 MRI Building, Penn State University, University Park, Pennsylvania 16801 (fonash@emprl.psu.edu). Dr. Fonash is director of Penn State University's Electronic Materials and Processing Research Laboratory and of the Penn State University site of the National Science Foundation's National Nanofabrication Users Network. His research interests lie in processing and device physics as applied to both macroelectronics and microelectronics. Prof. Fonash is a Fellow of the IEEE.