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IBM Journal of Research and Development  
Volume 43, Numbers 1/2, 1999
Plasma processing
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Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits - References

by D. R. Cote, S. V. Nguyen, A. K. Stamper, D. S. Armbrust, D. Tobben , R. A. Conti , and G. Y. Lee

References

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